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Largest selection of machines for stripping photographic dry-film or liquid etch resist.
Stripping systems for all types of primary and secondary aqueous resists, for all types of substrate thicknesses.
The basic component of the stripping process is the mechanical power of the jets.
For each type of production and product, we are able to propose the most appropriate filtration system; all liquid coming from the nozzles area is completely filtered before returning to the tanks below.


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eleven dd

Via Bergamo 12, 20037 Paderno Dugnano (MI) - Italy

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