top of page
Sviluoatrice.jpeg

DEVELOPING

Machines for developing dry-film and liquid photo resists used for etching or solder mask.

Development systems for all types of primary and secondary aqueous resists, for all types of substrate thicknesses. 

Tell us about your
next project

Fill out the form or call us to receive more information.

​

eleven dd

Via Bergamo 12, 20037 Paderno Dugnano (MI) - Italy

  • LinkedIn
bottom of page